{"extern":1,"type":"conference","date_updated":"2021-01-12T06:55:15Z","publist_id":"4945","publication_status":"published","quality_controlled":0,"title":"Processing and editing of faces using a measurement-based skin reflectance model","_id":"2090","doi":"10.1145/1179849.1180059","author":[{"id":"49876194-F248-11E8-B48F-1D18A9856A87","last_name":"Bickel","orcid":"0000-0001-6511-9385","first_name":"Bernd","full_name":"Bernd Bickel"},{"last_name":"Weyrich","full_name":"Weyrich, Tim","first_name":"Tim"},{"full_name":"Matusik, Wojciech","first_name":"Wojciech","last_name":"Matusik"},{"full_name":"Pfister, Hanspeter","first_name":"Hanspeter","last_name":"Pfister"},{"last_name":"Donner","first_name":"Craig","full_name":"Donner, Craig"},{"first_name":"Chien","full_name":"Tu, Chien","last_name":"Tu"},{"last_name":"Mcandless","full_name":"McAndless, Janet M","first_name":"Janet"},{"full_name":"Lee, Jinho","first_name":"Jinho","last_name":"Lee"},{"last_name":"Ngan","first_name":"Addy","full_name":"Ngan, Addy"},{"full_name":"Jensen, Henrik W","first_name":"Henrik","last_name":"Jensen"},{"last_name":"Groß","first_name":"Markus","full_name":"Groß, Markus S"}],"conference":{"name":"SIGGRAPH: Special Interest Group on Computer Graphics and Interactive Techniques"},"month":"07","date_created":"2018-12-11T11:55:39Z","citation":{"ista":"Bickel B, Weyrich T, Matusik W, Pfister H, Donner C, Tu C, Mcandless J, Lee J, Ngan A, Jensen H, Groß M. 2006. Processing and editing of faces using a measurement-based skin reflectance model. SIGGRAPH: Special Interest Group on Computer Graphics and Interactive Techniques.","chicago":"Bickel, Bernd, Tim Weyrich, Wojciech Matusik, Hanspeter Pfister, Craig Donner, Chien Tu, Janet Mcandless, et al. “Processing and Editing of Faces Using a Measurement-Based Skin Reflectance Model.” ACM, 2006. <a href=\"https://doi.org/10.1145/1179849.1180059\">https://doi.org/10.1145/1179849.1180059</a>.","apa":"Bickel, B., Weyrich, T., Matusik, W., Pfister, H., Donner, C., Tu, C., … Groß, M. (2006). Processing and editing of faces using a measurement-based skin reflectance model. Presented at the SIGGRAPH: Special Interest Group on Computer Graphics and Interactive Techniques, ACM. <a href=\"https://doi.org/10.1145/1179849.1180059\">https://doi.org/10.1145/1179849.1180059</a>","short":"B. Bickel, T. Weyrich, W. Matusik, H. Pfister, C. Donner, C. Tu, J. Mcandless, J. Lee, A. Ngan, H. Jensen, M. Groß, in:, ACM, 2006.","ama":"Bickel B, Weyrich T, Matusik W, et al. Processing and editing of faces using a measurement-based skin reflectance model. In: ACM; 2006. doi:<a href=\"https://doi.org/10.1145/1179849.1180059\">10.1145/1179849.1180059</a>","mla":"Bickel, Bernd, et al. <i>Processing and Editing of Faces Using a Measurement-Based Skin Reflectance Model</i>. ACM, 2006, doi:<a href=\"https://doi.org/10.1145/1179849.1180059\">10.1145/1179849.1180059</a>.","ieee":"B. Bickel <i>et al.</i>, “Processing and editing of faces using a measurement-based skin reflectance model,” presented at the SIGGRAPH: Special Interest Group on Computer Graphics and Interactive Techniques, 2006."},"date_published":"2006-07-01T00:00:00Z","day":"01","publisher":"ACM","year":"2006","status":"public"}